Md Khirom, Aini Rahayu (2015) Structural characterization of hgse2 thin films by electrochemical route. Project Report. Universiti Teknikal Malaysia Melaka, Melaka, Malaysia. (Submitted)
![]() |
Text (24 pages)
Structural Characterization Of HgSe2 Thin Films By Electrochemical Route 24 Pages.pdf - Submitted Version Download (568kB) |
![]() |
Text (Full Text)
Structural Characterization of HgSe2 Thin Film by Electrochemical Route.pdf - Submitted Version Restricted to Repository staff only Download (2MB) |
Abstract
Mercury diselenide (HgSe2) thin films were successfully electrodeposited on indium-tin-oxide; (ITO)-coated glass substrates and stainless steel substrates in which the deposition time for the thin films were fixed at 30 minutes. The reason is that the ion needs time to react within the chemical. There is no deposition on the substrate up to 20 minutes. The thin film is prepared by using chemical reaction of mercuric acid (H2HgO3) and selenium oxide (SeO2) given by formula H2HgO3 + 2SeO2 HgSe2 + H2O + 3O2. Electrodeposition voltages is set to -1.2 V, -1.4 V, -1.5 V and -1.6 V referring to the interception of forward and reverse scan of cyclic voltammetry. Thin films were characterized for their structural and surface morphological. The structural studies indicate that the HgSe2 agreed to be a simple cubic structure with a lattice parameters match the JCPDS, a= b= c= 0.60nm. Structural analysis via X-ray diffraction (XRD) analysis reveals that the films are polycrystalline with increasing intensity of XRD peaks in increasing electrodeposition voltages. Preferred orientation of (2 2 0) plane and (4 2 0) in HgSe2 was observed as the highest peak in the spectrum. The surface morphology of the films determined by scanning electron microscope (SEM) showed the growth of the films to be uniform and well covered for thinner films. However, at higher electrodeposition voltages, the structure of the films starts to break into grains due to the all of the ion has been deposited on the substrate.
Item Type: | Final Year Project (Project Report) |
---|---|
Uncontrolled Keywords: | Thin films -- Analysis, Electroplating |
Subjects: | T Technology > T Technology (General) T Technology > TA Engineering (General). Civil engineering (General) |
Divisions: | Library > Final Year Project > FKP |
Depositing User: | Ahmad Tarmizi Abdul Hadi |
Date Deposited: | 21 Sep 2016 02:44 |
Last Modified: | 28 Nov 2023 08:21 |
URI: | http://digitalcollection.utem.edu.my/id/eprint/17118 |
Actions (login required)
![]() |
View Item |