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Complex additives influence of NiTe2 thin film synthesize by electrodeposition

Hakimi, Akhmal Hakim (2014) Complex additives influence of NiTe2 thin film synthesize by electrodeposition. Project Report. Universiti Teknikal Malaysia Melaka, Melaka, Malaysia. (Submitted)

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Abstract

Thin film deposition technology can well be regarded as the major key to the creation of devices such as computer, since microelectronic solid state devices are all based on material structure create by deposition technique. Nickel telluride is one of the material involving in thin film technology. This report discussed about the complex additive of NiTe2 thin film synthesized by electrodeposition. The present of additive in the material can give the affect for the material itself. This final year project also explains in detailed the methodology in producing the semiconductor material from the raw material. Electrodeposition process is the selected method to produce NiTe2 thin film due it advantages like large scale production, easy monitoring of deposition process, minimum waste of the component and also large area deposition process. To analyzed the result, it involving thin film thickness measurements by gravimetric weight difference method, structural studies by X-Ray diffractometer (XRD), morphological and composional studies that analyse by scanning electron microscopy (SEM) and energy dispersive X-ray spectroscopy (EDX) also optical microscope.

Item Type: Final Year Project (Project Report)
Uncontrolled Keywords: Semiconductors, Electroplating, Thin films analysis
Subjects: T Technology > TA Engineering (General). Civil engineering (General)
Divisions: Library > Final Year Project > FKP
Depositing User: Norziyana Hanipah
Date Deposited: 30 Oct 2015 08:37
Last Modified: 30 Oct 2023 06:25
URI: http://digitalcollection.utem.edu.my/id/eprint/15184

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